Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
نویسندگان
چکیده
منابع مشابه
Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
Hafnium oxide (HfO2) thin films have attracted much attention owing to their usefulness in equivalent oxide thickness scaling in microelectronics, which arises from their high dielectric constant and thermodynamic stability with silicon. However, the surface passivation properties of such films, particularly on crystalline silicon (c-Si), have rarely been reported upon. In this study, the HfO2 ...
متن کاملAtomic Layer Deposition of Noble Metal Thin Films
3 Preface 4 List of publications 5 List of symbols and abbreviations 6
متن کاملAtomic Layer Deposition of Tin Monosulfide Thin Films
Thin film solar cells made from earth-abundant, non-toxic materials are needed to replace the current technology that uses Cu(In,Ga)(S,Se)2 and CdTe, which contain scarce and toxic elements. One promising candidate absorber material is tin monosulfide (SnS). In this report, pure, stoichiometric, single-phase SnS films were obtained by atomic layer deposition (ALD) using the reaction of bis(N,N’...
متن کاملAtomic/molecular layer deposition of hybrid inorganic-organic thin films
Aalto University, P.O. Box 11000, FI-00076 Aalto www.aalto.fi Author Pia Sundberg Name of the doctoral dissertation Atomic/molecular layer deposition of hybrid inorganic-organic thin films Publisher School of Chemical Technology Unit Department of Chemistry Series Aalto University publication series DOCTORAL DISSERTATIONS 201/2014 Field of research Inorganic Chemistry Manuscript submitted 11 Se...
متن کاملMechanical properties of atomic layer deposition-reinforced nanoparticle thin films.
Nanoparticle thin films (NTFs) exhibit multifunctionality, making them useful for numerous advanced applications including energy storage and conversion, biosensing and photonics. Poor mechanical reliability and durability of NTFs, however, limit their industrial and commercial applications. Atomic layer deposition (ALD) represents a unique opportunity to enhance the mechanical properties of NT...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: ECS Transactions
سال: 2019
ISSN: 1938-6737
DOI: 10.1149/1.3205041